Development of Laser-Produced Tin Plasma-Based EUV Light Source Technology for HVM EUV Lithography

Table 3

Transient phenomena of Sn target shape with different prepulse laser pulse durations.

	Units
Pulse duration	Sec	10 pico		10 nano
Pulse energy	mJ	2		2.7
Delay time between pre-pulse laser and CO2 laser	au.	1	2	1	2
Target shape 90 deg view