Preparation and Characterization of Ni-Doped TiO₂ Materials for Photocurrent and Photocatalytic Applications

Figure 1

XRD patterns of Ni-doped TiO₂ powders, where Ni = 0, 0.1 to 0.9 at. wt.% (a), and Ni = 1 to 10 at. wt.% (b), formed at 550°C for 6 h. Rutile TiO₂: ICDD File number: 03-065-1118; anatase TiO₂: ICDD File number: 03-065-5714; NiTiO₃: ICDD File number: 04-006-6640.

(a)

(b)