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VLSI Design
Volume 8 (1998), Issue 1-4, Pages 555-558
http://dx.doi.org/10.1155/1998/67609

Electrostatic Formation of Coupled Si/SiO2 Quantum Dot Systems

Department of Electrical Engineering, University of Notre Dame, Notre Dame 46556, IN, USA

Copyright © 1998 Hindawi Publishing Corporation. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Abstract

We present three-dimensional numerical modeling results for gated Si/SiO2 quantum dot systems in the few-electron regime. In our simulations, the electrostatic confining potential results from the Poisson equation assuming a self-consistent Thomas-Fermi charge model. We find that a very thin SiO2 top insulating layer allows an effective control with single-electron confinement in quantum dots with radius less than 10nm and investigate the detailed potential and resulting charge densities. Our three-dimensional finite-element modeling tool allows future investigations of the charge coupling in gated few-electron quantum-dot cellular automata.