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VLSI Design
Volume 6 (1998), Issue 1-4, Pages 335-339
http://dx.doi.org/10.1155/1998/89258

Simulation of Quantum-Dot Structures in Si/SiO2

Department of Electrical Engineering, University of Notre Dame, Notre Dame, IN 46556, USA

Copyright © 1998 Hindawi Publishing Corporation. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Abstract

We present numerical simulations for the design of gated few-electron quantum dot structures in the Si/SiO2 material system. Because of the vicinity of the quantum dots to the exposed surface, we take special care in treating the boundary conditions at the oxide/vacuum interfaces. In our simulations, the confining potential is obtained from the Poisson equation with a Thomas-Fermi charge model. We find that the dot occupancy can be effectively controlled in the few-electron regime.