VLSI Design

Research Article

Line Search-Based Inverse Lithography Technique for Mask Design

Figure 8

Comparison of optimized binary mask and pattern error for target pattern no. 1.
589128.fig.008a
(a) Optimized binary mask of [16]
589128.fig.008b
(b) Our optimized binary mask
589128.fig.008c
(c) Image pattern of optimized binary mask of [16], error = 1512
589128.fig.008d
(d) Image pattern of our optimized binary mask, error = 1376