Abstract
In modern design methodologies, a large fraction of chip area during placement is left
unused by standard cells and
allocated as “whitespace.” This is done for a variety of reasons
including the need for subsequent buffer insertion, as a means to
ensure routability, signal integrity, and low coupling capacitance
between wires, and to improve yield through DFM optimizations.
To this end, layout constraints often require a certain minimum
fraction of whitespace in each region of the chip. Our work
introduces several techniques for allocation of whitespace in
global, detail, and incremental placement. Our experiments show
how to efficiently improve wirelength by reallocating whitespace
in legal placements at the large scale. Additionally, for the
first time in the literature, we empirically demonstrate high-precision
control of whitespace in designs with macros and
obstacles. Our techniques consistently improve the quality of
whitespace allocation of top-down as well as analytical placement
methods and achieve low penalties on designs from the ISPD 2006
placement contest with minimal interconnect increase.