Abstract

A high temperature stage was designed for mounting onto a computer controlled four circle X-ray texture goniometer. This technique allowed to conduct in situ texture measurement, i.e. the determination of the texture evolution during rather than subsequent to annealing. The device was employed for temperatures up to 1000^°C.The furnace consisted of a resistance wire of Pt30Rh, which was isolated against the specimen with Al₂O₃ glue. The furnace with the specimen was covered by a hemispherical Kapton^TM foil. Inside the hemisphere a reducing gas atmosphere was used to avoid oxidation of the sample surface.