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Advances in Condensed Matter Physics
Volume 2012, Article ID 651587, 7 pages
http://dx.doi.org/10.1155/2012/651587
Research Article

The Effects of RF Sputtering Power and Gas Pressure on Structural and Electrical Properties of ITiO Thin Film

Department of Electrical Engineering, Kyungsung University, Busan 608-736, Republic of Korea

Received 17 August 2012; Accepted 18 September 2012

Academic Editor: Edvard Kokanyan

Copyright © 2012 Accarat Chaoumead et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Accarat Chaoumead, Youl-moon Sung, and Dong-Joo Kwak, “The Effects of RF Sputtering Power and Gas Pressure on Structural and Electrical Properties of ITiO Thin Film,” Advances in Condensed Matter Physics, vol. 2012, Article ID 651587, 7 pages, 2012. https://doi.org/10.1155/2012/651587.