The Effects of RF Sputtering Power and Gas Pressure on Structural and Electrical Properties of ITiO Thin Film

Figure 4

AFM morphologies of the ITiO film at different RF powers. (a) 220 W, (b) 250 W, (c) 280 W, (d) 300 W, (e) 350 W.

(a)

(b)

(c)

(d)

(e)