Analysis of Conduction and Charging Mechanisms in Atomic Layer Deposited Multilayered HfO<sub>2</sub>/Al<sub>2</sub>O<sub>3</sub> Stacks for Use in Charge Trapping Flash Memories

<div>Schematic representation of the test structure used in this study.</div>

Advances in Condensed Matter Physics

fig1

Figure 1

Figure 1: Analysis of Conduction and Charging Mechanisms in Atomic Layer Deposited Multilayered HfO<sub>2</sub>/Al<sub>2</sub>O<sub>3</sub> Stacks for Use in Charge Trapping Flash Memories 

Figure 1 | Analysis of Conduction and Charging Mechanisms in Atomic Layer Deposited Multilayered HfO2/Al2O3 Stacks for Use in Charge Trapping Flash Memories 