Retention Characteristics of CBTi144 Thin Films Explained by Means of X-Ray Photoemission Spectroscopy

<div class="floats-full-page floats-full-page-figure"><h2>Figure 7</h2><div class="floats-full-page-caption"><table>(a) Long-time retention characteristics at various electric fields (75 to 300 kV/cm), and (b) the long-time retention characteristics (<svg height="13.75" id="M24" style="vertical-align:-0.0pt" version="1.1" viewbox="0 0 17.299999 13.75" width="17.299999" xmlns="http://www.w3.org/2000/svg" xmlns:xlink="http://www.w3.org/1999/xlink">
<g transform="matrix(.017,-0,0,-.017,.062,13.688)"><path d="M46 650h247q112 0 169 -41q64 -49 64 -141q0 -91 -56.5 -143t-138.5 -62q-23 -3 -45 -1l-74 19v-157q0 -63 15.5 -77t83.5 -19v-28h-271v28q60 5 74 20t14 77v400q0 65 -12.5 79t-69.5 18v28zM212 559v-245q31 -12 73 -12q59 0 102 38t43 124q0 77 -42.5 115.5&#10;t-108.5 38.5q-44 0 -56 -12q-11 -8 -11 -47z" id="x50"></path></g>
<g transform="matrix(.012,-0,0,-.012,9.637,5.525)"><path d="M471 153q-22 -15 -61 -13q-25 31 -45.5 49.5t-56.5 41.5q4 -71 28 -134q-17 -33 -42 -46q-24 12 -42 46q24 63 28 134q-36 -23 -56.5 -41.5t-45.5 -49.5q-36 -2 -61 13q0 28 19 59q65 10 130 43q-65 33 -130 43q-19 31 -19 59q22 15 61 13q25 -31 45.5 -49.5t56.5 -41.5&#10;q-4 71 -28 134q17 33 42 46q24 -12 42 -46q-24 -63 -28 -134q36 23 56.5 41.5t45.5 49.5q36 2 61 -13q0 -28 -19 -59q-65 -10 -130 -43q65 -33 130 -43q19 -31 19 -59z" id="x2217"></path></g>
</svg> and <svg height="14.8" id="M25" style="vertical-align:-0.0pt" version="1.1" viewbox="0 0 17.299999 14.8" width="17.299999" xmlns="http://www.w3.org/2000/svg" xmlns:xlink="http://www.w3.org/1999/xlink">
<g transform="matrix(.017,-0,0,-.017,.062,14.737)"><path d="M46 650h247q112 0 169 -41q64 -49 64 -141q0 -91 -56.5 -143t-138.5 -62q-23 -3 -45 -1l-74 19v-157q0 -63 15.5 -77t83.5 -19v-28h-271v28q60 5 74 20t14 77v400q0 65 -12.5 79t-69.5 18v28zM212 559v-245q31 -12 73 -12q59 0 102 38t43 124q0 77 -42.5 115.5&#10;t-108.5 38.5q-44 0 -56 -12q-11 -8 -11 -47z" id="x50"></path></g>
<g transform="matrix(.012,-0,0,-.012,9.637,6.587)"><path d="M574 0h-62l-217 479h-2l-217 -479h-62l249 548h62z" id="x2227"></path></g>
</svg>)  measured at an applied electric field of 150 kV/cm for CBTi144 thin film deposited on (100) Pt/Ti/SiO<sub>2</sub>/Si substrate at 700<svg height="12.9375" id="M26" style="vertical-align:-0.0pt" version="1.1" viewbox="0 0 5.1624999 12.9375" width="5.1624999" xmlns="http://www.w3.org/2000/svg" xmlns:xlink="http://www.w3.org/1999/xlink">
<g transform="matrix(.012,-0,0,-.012,.062,4.712)"><path d="M326 255q0 -56 -41 -96t-99 -40t-99 40t-41 96t41 96t99 40t99 -40t41 -96zM274 255q0 38 -25.5 65t-62.5 27t-62.5 -27t-25.5 -65t25.5 -65t62.5 -27t62.5 27t25.5 65z" id="x2218"></path></g>
</svg>C for 2 hours.</table></div><div class="floats-full-page-content"><table class="table-group" width="800px"><tr class="fig-image" id="a"><td><img alt="710269.fig.007a" src="https://static-01.hindawi.com/articles/amse/volume-2010/710269/figures/710269.fig.007a.jpg" /></td></tr><tr class="fig-caption"><td align="center"><table><tr><td><b>(a) </b></td></tr></table></td></tr><tr class="fig-image" id="b"><td><img alt="710269.fig.007b" src="https://static-01.hindawi.com/articles/amse/volume-2010/710269/figures/710269.fig.007b.jpg" /></td></tr><tr class="fig-caption"><td align="center"><table><tr><td><b>(b) </b></td></tr></table></td></tr></table></div></div>

Figure 7 | Retention Characteristics of CBTi144 Thin Films Explained by Means of X-Ray Photoemission Spectroscopy

title

Figure 7: Retention Characteristics of CBTi144 Thin Films Explained by Means of X-Ray Photoemission Spectroscopy

description

Figure 7

About this journal

<p><em>Advances in Materials Science and Engineering </em>publishes research in all areas of materials science and engineering, including the synthesis and properties of materials, and their applications in engineering applications.</p>


Journal profile

Meet the editorial board

<p>Chief Editor, Amit Bandyopadhyay, is based at Washington State University and is interested in &nbsp;the fields of additive manufacturing or 3D printing of advanced materials. His current research is focused on metal additive manufacturing, biomedical devices and multi‑materials structures.</p>


Editor spotlight

Submit to Special Issue

We currently have a number of Special Issues open for submission. Special Issues highlight emerging areas of research within a field, or provide a venue for a deeper investigation into an existing research area.