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Advances in Materials Science and Engineering
Volume 2012, Article ID 809028, 9 pages
Research Article

Reactive Chemical Vapor Deposition Method as New Approach for Obtaining Electroluminescent Thin Film Materials

1Laboratory of Chemistry of Coordination Compounds, Chemistry Department, Lomonosov Moscow State University, 1-3 Leninskie Gory, 119991 Moscow, Russia
2Luminescence Division, Optical Department, Lebedev Physical Institute, 53 Leninsky Prosp., 119991 Moscow, Russia
3School of Chemistry, Centre for Synthesis and Chemical Biology, Trinity College Dublin, College Green, Dublin 2, Ireland

Received 21 March 2012; Revised 1 May 2012; Accepted 8 May 2012

Academic Editor: Yong Qiu

Copyright © 2012 Valentina V. Utochnikova et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


The new reactive chemical vapor deposition (RCVD) method has been proposed for thin film deposition of luminescent nonvolatile lanthanide aromatic carboxylates. This method is based on metathesis reaction between the vapors of volatile lanthanide dipivaloylmethanate (Ln(dpm)3) and carboxylic acid (HCarb orH2Carb′) and was successfully used in case of HCarb. Advantages of the method were demonstrated on example of terbium benzoate (Tb(bz)3) and o-phenoxybenzoate thin films, and Tb(bz)3 thin films were successfully examined in the OLED with the following structure glass/ITO/PEDOT:PSS/TPD/Tb(bz)3/Ca/Al. Electroluminescence spectra of Tb(bz)3 showed only typical luminescent bands, originated from transitions of the terbium ion. Method peculiarities for deposition of compounds of dibasic acids H2Carb′ are established on example of terbium and europium terephtalates and europium 2,6-naphtalenedicarboxylate.