Advances in Materials Science and Engineering / 2012 / Article / Fig 5

Review Article

Nonstoichiometry in Studied by Ion Beam Methods and Photoelectron Spectroscopy

Figure 5

Atomic ratio of O/Ti, as determined by RBS and NRA, for two sets (I, II) of thin films deposited by sputtering at different growth rates . Sets I and II have different film thickness, I: 100–130 nm, II: 30–60 nm. The solid line is a guide to the eye.
826873.fig.005

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