Nonstoichiometry in Studied by Ion Beam Methods and Photoelectron Spectroscopy
Atomic ratio of O/Ti, as determined by RBS and NRA, for two sets (I, II) of thin films deposited by sputtering at different growth rates . Sets I and II have different film thickness, I: 100–130 nm, II: 30–60 nm. The solid line is a guide to the eye.
Article of the Year Award: Outstanding research contributions of 2020, as selected by our Chief Editors. Read the winning articles.