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Advances in Materials Science and Engineering
Volume 2012 (2012), Article ID 923769, 7 pages
http://dx.doi.org/10.1155/2012/923769
Research Article

Characteristics and Photocatalytic Properties of T i O 2 Thin Film Prepared by Sputter Deposition and Post-N+ Ion Implantation

1Department of Electrical Engineering, Faculty of Engineering, Kogakuin University, 2665-1, Nakano-machi, Hachioji-shi, Tokyo 192-0015, Japan
2Division of Basic Liberal Arts, Kogakuin University, 2665-1, Nakano-machi, Hachioji-shi, Tokyo 192-0015, Japan
3Tokyo Metropolitan Industrial Technology Research Institute, 3-13-10, Nishigaoka, Kitaku, Tokyo 115-8586, Japan

Received 30 June 2011; Revised 5 September 2011; Accepted 12 September 2011

Academic Editor: Koumei Baba

Copyright © 2012 Haider A. Shukur et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Haider A. Shukur, Mitsunobu Sato, Isao Nakamura, and Ichiro Takano, “Characteristics and Photocatalytic Properties of Thin Film Prepared by Sputter Deposition and Post-N+ Ion Implantation,” Advances in Materials Science and Engineering, vol. 2012, Article ID 923769, 7 pages, 2012. doi:10.1155/2012/923769