Advances in Materials Science and Engineering / 2012 / Article / Fig 2

Research Article

Characteristics and Photocatalytic Properties of T i O 2 Thin Film Prepared by Sputter Deposition and Post-N+ Ion Implantation

Figure 2

AFM top-view images of the unirradiated A-, R-, and M-TiO2 thin film (a) and the irradiated A-, R-, and M-TiO2 thin film with an ion dose of 5.0 × 1015 ions/cm2 (b).
923769.fig.002a
(a)
923769.fig.002b
(b)

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