Characteristics and Photocatalytic Properties of TiO₂ Thin Film Prepared by Sputter Deposition and Post-N⁺ Ion Implantation

Table 1

O, Ti, and N atomic concentration of the A-, R-, and M-TiO₂ thin films under several N⁺ ion doses.

N^+ ion dose	Atomic con.
	A-TiO2 (%)			R-TiO2 (%)			M-TiO2 (%)
	O	Ti	N	O	Ti	N	O	Ti	N
2.5 × 10^15 ions/cm^2	75.8	22.1	2.1	68.5	30.5	1.0	73.6	22.7	3.8
5.0 × 10^15 ions/cm^2	71.3	23.2	5.5	67.0	29.1	3.9	68.6	23.2	8.3
7.5 × 10^15 ions/cm^2	67.6	21.9	10.5	64.1	30.6	5.3	63.2	22.0	14.9