Advances in Materials Science and Engineering / 2012 / Article / Tab 1

Research Article

Characteristics and Photocatalytic Properties of T i O 2 Thin Film Prepared by Sputter Deposition and Post-N+ Ion Implantation

Table 1

O, Ti, and N atomic concentration of the A-, R-, and M-TiO2 thin films under several ion doses.

ion doseAtomic con.
A-TiO2 (%)R-TiO2 (%)M-TiO2 (%)

2.5 × 1015 ions/cm275.822.12.168.530.51.073.622.73.8
5.0 × 1015 ions/cm271.323.25.567.029.13.968.623.28.3
7.5 × 1015 ions/cm267.621.910.564.130.65.363.222.014.9

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