Advances in Materials Science and Engineering

Research Article

Series Resistance Analysis of Passivated Emitter Rear Contact Cells Patterned Using Inkjet Printing

Figure 3

Focused ion beam (FIB) cross-section image of the rear contact of a test cell. Unwanted electroless Ni plating at the rear point contact has displaced some of the Al, contacting the Si surface and increasing the contact resistance [18].
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