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Advances in Materials Science and Engineering
Volume 2013, Article ID 835942, 4 pages
http://dx.doi.org/10.1155/2013/835942
Research Article

Deposition of Low Stress Silicon Nitride Thin Film and Its Application in Surface Micromachining Device Structures

1College of Mechanical and Electrical Engineering, Wenzhou University, Wenzhou 323035, China
2State Key Lab of Transducer Technology, Chinese Academy of Sciences, Shanghai 200050, China

Received 26 July 2013; Accepted 23 September 2013

Academic Editor: Yan Yang

Copyright © 2013 Beirong Zheng et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Beirong Zheng, Chen Zhou, Quan Wang, Yifeng Chen, and Wei Xue, “Deposition of Low Stress Silicon Nitride Thin Film and Its Application in Surface Micromachining Device Structures,” Advances in Materials Science and Engineering, vol. 2013, Article ID 835942, 4 pages, 2013. https://doi.org/10.1155/2013/835942.