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Advances in Materials Science and Engineering
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Advances in Materials Science and Engineering
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2013
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Article
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Tab 1
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Research Article
Deposition of Low Stress Silicon Nitride Thin Film and Its Application in Surface Micromachining Device Structures
Table 1
LS SiN deposition parameter.
Temperature (°C)
Pressure (mTorr)
Gas (sccm)
Handle
Centre
Source
NH
3
DCS
835
875
860
289
8
80