Comparison of Microstructural and Morphological Properties of Electrodeposited Fe-Cu Thin Films with Low and High Fe : Cu Ratio
Figure 3
SEM topographic images of Fe–Cu films electrodeposited from the electrolytes with low and high Fe ion concentrations (a) 0.02 M, (b) 0.08 M, and (c) 0.08 M at lower magnification, respectively.
