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Advances in Materials Science and Engineering
Volume 2014, Article ID 187416, 6 pages
http://dx.doi.org/10.1155/2014/187416
Research Article

Optimization of the Cathode Arc Plasma Deposition Processing Parameters of ZnO Film Using the Grey-Relational Taguchi Method

1Department of Electrical Engineering, National Kaohsiung University of Applied Sciences, Kaohsiung 807, Taiwan
2Medical Devices and Opto-Electronics Equipment Department, Metal Industry Research and Development Center, Kaohsiung 821, Taiwan

Received 22 November 2013; Accepted 14 April 2014; Published 8 May 2014

Academic Editor: Chien-Hung Yeh

Copyright © 2014 Shuo-Fu Hsu et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Shuo-Fu Hsu, Jyh-Horng Chou, Chun-Hsiung Fang, and Min-Hang Weng, “Optimization of the Cathode Arc Plasma Deposition Processing Parameters of ZnO Film Using the Grey-Relational Taguchi Method,” Advances in Materials Science and Engineering, vol. 2014, Article ID 187416, 6 pages, 2014. https://doi.org/10.1155/2014/187416.