Research Article
The Microstructures and Electrical Resistivity of (Al, Cr, Ti)FeCoNiOx High-Entropy Alloy Oxide Thin Films
Figure 3
The plan-view micrographs of the as-annealed (a) FCN film; (b) CFCN film; (c) AFCN film; and (d) TFCN film, respectively. The insets are the corresponding SAD (marked by DP) and DF image (marked by DF) of each as-annealed thin film.
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(b) |
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