Advances in Materials Science and Engineering / 2015 / Article / Fig 7

Research Article

The Microstructures and Electrical Resistivity of (Al, Cr, Ti)FeCoNiOx High-Entropy Alloy Oxide Thin Films

Figure 7

EPMA analyzed result. (a) The cross section SEM micrograph of the TFCNO thin film after annealing at 1000°C for 30 min and the corresponding element mapping of (b) Ti; (c) O; (d) Fe; (e) Co; and (f) Ni.