The Microstructures and Electrical Resistivity of (Al, Cr, Ti)FeCoNiO_x High-Entropy Alloy Oxide Thin Films

Figure 7

EPMA analyzed result. (a) The cross section SEM micrograph of the TFCNO thin film after annealing at 1000°C for 30 min and the corresponding element mapping of (b) Ti; (c) O; (d) Fe; (e) Co; and (f) Ni.

(a)

(b)

(c)

(d)

(e)

(f)