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Advances in Materials Science and Engineering
Volume 2015, Article ID 847191, 7 pages
http://dx.doi.org/10.1155/2015/847191
Research Article

A Study of Thin Film Resistors Prepared Using Ni-Cr-Si-Al-Ta High Entropy Alloy

1Department of Mechanical Engineering, National Pingtung University of Science & Technology, Pingtung 91201, Taiwan
2Department of Electrical Engineering, National Cheng Kung University, Tainan 701, Taiwan
3Department of Materials Engineering, National Pingtung University of Science & Technology, Pingtung 91201, Taiwan

Received 23 October 2014; Revised 29 November 2014; Accepted 28 December 2014

Academic Editor: Ke Fu Yao

Copyright © 2015 Ruei-Cheng Lin et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Ruei-Cheng Lin, Tai-Kuang Lee, Der-Ho Wu, and Ying-Chieh Lee, “A Study of Thin Film Resistors Prepared Using Ni-Cr-Si-Al-Ta High Entropy Alloy,” Advances in Materials Science and Engineering, vol. 2015, Article ID 847191, 7 pages, 2015. https://doi.org/10.1155/2015/847191.