A Study of Thin Film Resistors Prepared Using Ni-Cr-Si-Al-Ta High Entropy Alloy

<div>X-ray diffraction patterns of Ni-Cr-Si-Al-Ta thin films sputtered at 200 W with different annealing temperatures.</div>

Advances in Materials Science and Engineering

Figure 2: A Study of Thin Film Resistors Prepared Using Ni-Cr-Si-Al-Ta High Entropy Alloy 