Research Article
A Study of Thin Film Resistors Prepared Using Ni-Cr-Si-Al-Ta High Entropy Alloy
Figure 4
SEM micrographs of Ni-Cr-Si-Al-Ta films sputtered and annealed at (a) 200 W/300°C, (b) 200 W/400°C, (c) 200 W/500°C, and (d) 100 W/500°C.
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| (b) |
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