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Advances in Materials Science and Engineering
Volume 2015, Article ID 969580, 8 pages
http://dx.doi.org/10.1155/2015/969580
Research Article

Effect of Annealing on Microstructure and Mechanical Properties of Magnetron Sputtered Cu Thin Films

School of Materials Science and Engineering, Shanxi Key Laboratory of Metallic Materials Forming Theory and Technology, Taiyuan University of Science and Technology, Taiyuan 030024, China

Received 11 December 2014; Revised 26 February 2015; Accepted 26 February 2015

Academic Editor: Filippo Giannazzo

Copyright © 2015 Shiwen Du and Yongtang Li. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Shiwen Du and Yongtang Li, “Effect of Annealing on Microstructure and Mechanical Properties of Magnetron Sputtered Cu Thin Films,” Advances in Materials Science and Engineering, vol. 2015, Article ID 969580, 8 pages, 2015. https://doi.org/10.1155/2015/969580.