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Advances in Materials Science and Engineering
Volume 2016, Article ID 9387651, 7 pages
http://dx.doi.org/10.1155/2016/9387651
Research Article

Influence of Deposition Condition on Y2O3 Coatings Produced by Pulsed Electrophoretic Deposition

1Interdisciplinary Graduate School of Science and Engineering, Shimane University, 1060 Nishikawatsu, Matsue, Shimane 690-8504, Japan
2Graduate School of Science and Technology, Shizuoka University, 3-5-1 Johoku, Hamamatsu, Shizuoka 432-8561, Japan
3Ceramic Research Laboratory, Nagoya Institute of Technology, 10-6-29 Asahigaoka, Tajimi, Gifu 507-0071, Japan

Received 13 January 2016; Revised 4 April 2016; Accepted 13 April 2016

Academic Editor: Meilin Liu

Copyright © 2016 Hidetoshi Miyazaki et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Abstract

Y2O3 nanoparticle suspension aqueous solution was prepared using citric acid. Then, Y2O3 film was deposited using this solution with pulsed electrophoretic deposition (EPD). A dense Y2O3 film of 25.7 μm thickness was obtained with deposition conditions of 0.5 wt% Y2O3 concentration, bias voltage of 0.5 V, and bias frequency of 1 kHz. The respective resistivities of the as-deposited film and films heat-treated at 200°C and 400°C were 2.84 × 103 Ω·cm, 5.36 × 104 Ω·cm, and 2.05 × 106 Ω·cm. A 59.8 μm thick dense Y2O3 film was obtained using two-step deposition with change of the bias voltage: a first step of 0.5 V and a second step of 2.0 V.