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Advances in Materials Science and Engineering
Volume 2016, Article ID 9387651, 7 pages
http://dx.doi.org/10.1155/2016/9387651
Research Article

Influence of Deposition Condition on Y2O3 Coatings Produced by Pulsed Electrophoretic Deposition

1Interdisciplinary Graduate School of Science and Engineering, Shimane University, 1060 Nishikawatsu, Matsue, Shimane 690-8504, Japan
2Graduate School of Science and Technology, Shizuoka University, 3-5-1 Johoku, Hamamatsu, Shizuoka 432-8561, Japan
3Ceramic Research Laboratory, Nagoya Institute of Technology, 10-6-29 Asahigaoka, Tajimi, Gifu 507-0071, Japan

Received 13 January 2016; Revised 4 April 2016; Accepted 13 April 2016

Academic Editor: Meilin Liu

Copyright © 2016 Hidetoshi Miyazaki et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Linked References

  1. C. D. W. Wilkinson, L. Deng, and M. Rahman, “Issues in etching compound and Si-based devices,” Japanese Journal of Applied Physics, vol. 41, no. 6, pp. 4261–4266, 2002. View at Publisher · View at Google Scholar · View at Scopus
  2. R. Doering and Y. Nishi, Handbook of Semiconductor Manufacturing Technology, CRC Press, New York, NY, USA, 2008.
  3. D.-M. Kim, K.-B. Kim, S.-Y. Yoon, Y.-S. Oh, H.-T. Kim, and S.-M. Lee, “Effects of artificial pores and purity on the erosion behaviors of polycrystalline Al2O3 ceramics under fluorine plasma,” Journal of the Ceramic Society of Japan, vol. 117, no. 1368, pp. 863–867, 2009. View at Publisher · View at Google Scholar · View at Scopus
  4. J. Iwasawa, R. Nishimizu, M. Tokita, M. Kiyohara, and K. Uematsu, “Plasma-resistant dense yttrium oxide film prepared by aerosol deposition process,” Journal of the American Ceramic Society, vol. 90, pp. 2327–2332, 2007. View at Publisher · View at Google Scholar
  5. Tocalo, “Plasma-resistant dense yttrium oxide film prepared by aerosol deposition process,” The Journal of the Vacuum Society of Japan, vol. 52, pp. 648–651, 2009. View at Google Scholar
  6. Y. Akiyama, “Modeling thermal CVD,” Journal of Chemical Engineering of Japan, vol. 35, no. 8, pp. 701–713, 2002. View at Publisher · View at Google Scholar · View at Scopus
  7. Japan Ceratec, AIST, Jpn. Patent, 321183A, 2007.
  8. K. Kanamura and J.-I. Hamagami, “Innovation of novel functional material processing technique by using electrophoretic deposition process,” Solid State Ionics, vol. 172, no. 1–4, pp. 303–308, 2004. View at Publisher · View at Google Scholar · View at Scopus
  9. B. Neirinck, J. Fransaer, O. Van der Biest, and J. Vleugels, “Aqueous electrophoretic deposition in asymmetric AC electric fields (AC–EPD),” Electrochemistry Communications, vol. 11, no. 1, pp. 57–60, 2009. View at Publisher · View at Google Scholar · View at Scopus
  10. J. He, X.-D. Li, J.-G. Li, and X.-D. Sun, “Colloidal stability of aqueous suspensions of nano-yttria powders,” International Journal of Materials Science and Engineering, vol. 1, no. 1, pp. 28–31, 2013. View at Publisher · View at Google Scholar
  11. C. K. Campbell, “Some dielectric properties of electron-beam evaporated yttrium oxide thin films,” Thin Solid Films, vol. 6, no. 3, pp. 197–202, 1970. View at Publisher · View at Google Scholar · View at Scopus