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Advances in Materials Science and Engineering
Volume 2017, Article ID 8285230, 9 pages
Research Article

Determination of Optical Properties of Thin Films from Ketteler-Helmholtz Dispersion Relations: Application to the Case of Ultraviolet Irradiated Zirconium Oxide

Groupe de Recherche sur les Couches Minces et la Photonique, Département de Physique et d’Astronomie, Université de Moncton, 18 avenue Antonine-Maillet, Moncton, NB, Canada E1A 3E9

Correspondence should be addressed to Serge Gauvin; ac.notcnomu@nivuag.egres

Received 30 March 2017; Revised 5 June 2017; Accepted 19 June 2017; Published 13 August 2017

Academic Editor: Angela De Bonis

Copyright © 2017 Jean Desforges et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


A new method based on the Ketteler-Helmholtz dispersion relations is described. This method allows accurately determining the optical properties of thin films from a single transmittance curve. The case of zirconium oxide thin film postdeposition irradiated with ultraviolet light is analysed. The effect of ultraviolet irradiation is compared with low temperature postdeposition heating. It is shown that both processes have a comparable effect on the optical properties of the films. However, as our analysis leads to inferring that ultraviolet irradiation produces smoother film surfaces, the use of ultraviolet irradiation is an interesting alternative to the heating process. Accordingly, the reduction of light scattering from the interface with air provides films of better optical quality, which is especially valuable in case of multilayer systems.