Inkjet Printing as High-Throughput Technique for the Fabrication of NiCo₂O₄ Films

Table 1

Summary of reports on NiCo₂O₄ films prepared by different techniques.

Synthesis method	Precursors	Substrate	Thickness	XRD phase	Application/properties	Ref.
Inkjet printing	Ni(NO3)2·6H2O; Co(NO3)2·6H2O; Glycerol, deionized water	FTO	490 nm	Pure	Water oxidation reaction	This work
RF sputtering	Ni-Co metal alloy targets	Silicon	550–830 nm	Impure	Electrical and magnetic	[8]
Pulsed laser deposition	Polycrystalline NiCo2O4 target	MgAl2O4 (001)	240 nm	Pure	Electrical and magnetic	[16]
Spray pyrolysis	Ni(NO3)2·6H2O; Co(NO3)2·6H2O; Methanol	Aluminum foil	12 µm	Pure	Mesoporosity	[36]
Sol-gel	Co(CH3COO)2·4H2O; Ni(CH3COO)2·4H2O; 2-Methoxyethanol; Ethanolamine	Al2O3 (0001)	900–1000 nm	Impure	Electrical resistivity	[2]
Hydrothermal	Ni(NO3)2·6H2O; Co(NO3)2·6H2O; Urea, NH4F, deionized water	FTO	1–4.5 µm	Pure	Dye sensitized solar cells	[26]
Chemical bath deposition	NiCl2·6H2O; CoCl2·6H2O; Deionized water; KOH (electrolyte)	Stainless steel	2.3–18 µm	Pure	Supercapacitors	[37]
Electrodeposition	Ni(NO3)2·6H2O; Co(NO3)2·6H2O; Deionized water; KCl (electrolyte)	Stainless steel and Indium-Tin Oxide (ITO)	4 µm	Pure	Methanol fuel cells	[6]
Electrodeposition	Ni(NO3)2·6H2O; Co(NO3)2·6H2O; Deionized water; KCl (electrolyte)	ITO	Not reported	Pure	Glucose sensing	[15]
Spray pyrolysis	NiCl2·6H2O; CoCl2·6H2O; Deionized water	FTO	Not reported	Pure	Supercapacitors	[4]
Solvothermal	NiCl2·6H2O; CoCl2·6H2O; Hexamethylenetetramine	FTO	Not reported	Pure	Water oxidation reaction	[17]