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Advances in OptoElectronics
Volume 2007 (2007), Article ID 32707, 4 pages
http://dx.doi.org/10.1155/2007/32707
Research Article

Wafer Surface Charge Reversal as a Method of Simplifying Nanosphere Lithography for Reactive Ion Etch Texturing of Solar Cells

Centre of Excellence for Advanced Silicon Photovoltaics and Photonics, University of New South Wales, Sydney NSW 2052, Australia

Received 23 April 2007; Accepted 18 July 2007

Academic Editor: Armin G. Aberle

Copyright © 2007 Daniel Inns et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Daniel Inns, Patrick Campbell, and Kylie Catchpole, “Wafer Surface Charge Reversal as a Method of Simplifying Nanosphere Lithography for Reactive Ion Etch Texturing of Solar Cells,” Advances in OptoElectronics, vol. 2007, Article ID 32707, 4 pages, 2007. doi:10.1155/2007/32707