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Advances in OptoElectronics
Volume 2015 (2015), Article ID 917029, 8 pages
Research Article

All-Optical Surface Micropatterning by Electric Field Intensity Gradient

Institute of Solid State Physics, University of Latvia, 8 Kengaraga, Riga LV-1063, Latvia

Received 4 June 2015; Revised 15 August 2015; Accepted 31 August 2015

Academic Editor: Jung Y. Huang

Copyright © 2015 U. Gertners and J. Teteris. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


In this report an all-optical photo-induced formation of surface relief gratings is shown. For the surface patterning of As2S3 and As4S1.5Se4.5 films a direct holographic recording setup with a 532 nm wavelength Nd:YAG CW laser light was used. Our investigations have shown that the light-induced mass transfer process strongly depends on the material itself and on the polarization of the light. It has been shown that an electric field intensity gradient has to be obtained to achieve a direct patterning. The evolution of a surface relief in relation to recording parameters and thickness of the sample has been investigated in detail.