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ElectroComponent Science and Technology
Volume 5 (1979), Issue 4, Pages 223-226

Electrical Properties of Epitaxial Aluminium Films

Institute of Physics, Wrocław Technical University, Wybrzeze Wyspiańskiego 27, Wrocław 50–370, Poland

Received 23 May 1978; Accepted 10 August 1978

Copyright © 1979 Hindawi Publishing Corporation. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


The resistivity of monocrystalline Al films was measured and compared with the resistivity calculated in terms of the function which takes into account both the external and the internal size effects. A comparison of the theoretical and experimental curves shows that the specular reflection coefficient (p) is small, while the coefficient of electron transmission through the grain boundary (r) increases with increasing film thickness.