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ElectroComponent Science and Technology
Volume 7 (1980), Issue 1-3, Pages 19-22

D.C. Sputtering Process: Its Characterization and its Problems When Applied to Tin-Dioxide Thin-Films

Department of Electrical Engineering, University of Pittsburgh, Pittsburgh 15261, PA, USA

Received 11 April 1979

Copyright © 1980 Hindawi Publishing Corporation. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


This paper discusses the problems involved in obtaining reliable and reproducible thin films of Sb-doped SnO2 films by the d.c. sputtering process. An attempt to characterize the process is made by correlating the deposition parameters with the factors that contribute to the conductivity of the SnO2 films. The areas of concern are identified, and guidelines are offered for making the process and the film properties controllable.