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ElectroComponent Science and Technology
Volume 9 (1981), Issue 1, Pages 59-65
http://dx.doi.org/10.1155/APEC.9.59

Processing Considerations of Thick Film Devices With Multilayered Resistors

1Production Engineering Research Laboratory, Hitachi, Ltd., Yokohama, Japan
2Takasaki Works, Hitachi, Ltd., Takasaki, Japan

Copyright © 1981 Hindawi Publishing Corporation. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Nobuyuki Sugishita, Akira Ikegami, and Tsuneo Endo, “Processing Considerations of Thick Film Devices With Multilayered Resistors,” ElectroComponent Science and Technology, vol. 9, no. 1, pp. 59-65, 1981. doi:10.1155/APEC.9.59