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K. Kawabata, T. Muto, "Electrical Properties of Titanium Nitride Thin Films Deposited by Reactive Sputtering", Active and Passive Electronic Components, vol. 8, Article ID 694307, 1 page, 1981. https://doi.org/10.1155/APEC.8.249
Electrical Properties of Titanium Nitride Thin Films Deposited by Reactive Sputtering
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Copyright © 1981 Hindawi Publishing Corporation. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.