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ElectroComponent Science and Technology
Volume 11 (1984), Issue 2, Pages 123-136
http://dx.doi.org/10.1155/APEC.11.123

Measurement of the Tunneling and Hopping Parameters in RuO2 Thick Films

Department of Physics, University of South Florida, Tampa 33620, Florida, USA

Received 14 July 1982; Accepted 10 March 1983

Copyright © 1984 Hindawi Publishing Corporation. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

N. C. Halder and R. J. Snyder, “Measurement of the Tunneling and Hopping Parameters in RuO2 Thick Films,” ElectroComponent Science and Technology, vol. 11, no. 2, pp. 123-136, 1984. doi:10.1155/APEC.11.123