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ElectroComponent Science and Technology
Volume 11 (1985), Issue 4, Pages 271-280

Reproducibility of Properties of SnOx Thin Films Prepared by Reactive Sputtering

Institute of Electron Technology of Wroclaw Technical University, Janiszewskiego 11/17, Wroclaw 50-372, Poland

Received 25 October 1982; Accepted 18 October 1983

Copyright © 1985 Hindawi Publishing Corporation. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.


The preparation of tin dioxide films by low energy reactive sputtering of tin and tin-antimony (1-10% wt. Sb) in an oxygen – argon atmosphere is described. The dependences of oxygen content in the range from 0 to 50%, target compositions, substrate temperature of 300 K-573 K on minimum resistivity at satisfactory transmittance and on reproducibility are discussed. The correlation between the electrical and optical properties and the microstructure of the films is shown.