Effects of Annealing Time on the Performance of OTFT on Glass with ZrO₂ as Gate Dielectric

Figure 4

AFM images (scan area of 2 μm × 2 μm) of ZrO₂ surface with different annealing treatment times: (a) 0 min, (b) 15 min, and (c) 60 min.

(a)

(b)

(c)