Conference Paper

Oxidation State of a Polyurethane Membrane after Plasma Etching

Table 1

Atomic composition for unetched and etched PU membrane surface as determined by XPS. Data shows mean for 3 scans per sample, .

Etching power (W) Etching duration (s)Atomic concentration percentage (at.%) ± SD
CONSi

Unetched
2040
80
5040
80
10040
80
18040
80