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Conference Papers in Science
/
2014
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Article
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Tab 1
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Conference Paper
Oxidation State of a Polyurethane Membrane after Plasma Etching
Table 1
Atomic composition for unetched and etched PU membrane surface as determined by XPS. Data shows mean for 3 scans per sample,
.
Etching power (W)
Etching duration (s)
Atomic concentration percentage (at.%) ± SD
C
O
N
Si
Unetched
20
40
80
50
40
80
100
40
80
180
40
80