Conference Paper
Oxidation State of a Polyurethane Membrane after Plasma Etching
Table 3
Oxidation model for plasma etched PU, showing the predicted contribution of each group to the total oxidation. Data shows mean ± SD for
.
| Etching parameters | Composition (at.%) | O=C(–O)–N | O–C(=O)–N | O=C(–O)2R | (O–)2C=O | O=C(–O)R | HO–C=O | Si |
| Unetched | | | | | N/A | N/A | | 20 W 40 s | | | | | | | | 20 W 80 s | | | | | | | | 50 W 40 s | | | | | | | | 50 W 80 s | | | | | | | | 100 W 40 s | | | | | | | | 100 W 80 s | | | | | | | | 180 W 40 s | | | | | | | | 180 W 80 s | | | | | | | |
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