Conference Paper

Oxidation State of a Polyurethane Membrane after Plasma Etching

Table 3

Oxidation model for plasma etched PU, showing the predicted contribution of each group to the total oxidation. Data shows mean ± SD for .

Etching parametersComposition (at.%)
O=C(–O)–NO–C(=O)–NO=C(–O)2R(O–)2C=OO=C(–O)RHO–C=OSi

Unetched N/AN/A
20 W 40 s
20 W 80 s
50 W 40 s
50 W 80 s
100 W 40 s
100 W 80 s
180 W 40 s
180 W 80 s