Research Article
An Optimized Adsorbent Sampling Combined to Thermal Desorption GC-MS Method for Trimethylsilanol in Industrial Environments
Table 1
Thermal desorption (TD)-GC-MS conditions.
| | TD parameters | | | TD model | Gerstel thermal desorption system (TDS)/cooled injection system (CIS) | | 1st desorption temperature (°C) | 300 | | 1st desorption holding time (min) | 5 | | 1st desorption flow rate (mL/min) | 80 | | Transfer line temperature (°C) | 280 | | CIS cryofocusing temperature (°C) | −30 | | CIS 2nd desorption temperature (°C) | 300 | | 2nd desorption holding time (min) | 5 | | Cryofocusing liquid | Liquid nitrogen (N2) |
| | GC parameters | | | GC model | Agilent 7890A GC | | Split ratio | 20 : 1 | | Column | HP-5MS (60 m Length, 0.25 mm I.D., 0.250 m film thickness) | | Oven temperature program | 40°C, hold for 2 min | | | 8°C/min to 180°C, hold for 2 min | | | 10°C/min to 250°C, hold for 1 min | | | 15°C/min to 300°C, hold for 5 min | | Run time (min) | 37.83 |
| | MS parameters | | | MS model | Agilent 5975C inert XL MSD with triple-axis detector | | Electron ionization voltage (eV) | 70 | | Quadrupole temperature (°C) | 150 | | Source temperature (°C) | 230 | | Mass mode | Full scan and SIM (selected-ion monitoring), | | Mass range (m/z) | 35~550 in full scan | | | 45, 47, and 75 in SIM (for TMSOH) |
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