Improved Reflectarray Phase-Only Synthesis Using the Generalized Intersection Approach with Dielectric Frame and First Principle of Equivalence

Figure 6

Dielectric frame effect on the shaped patterns for polarization when it is added after a synthesis was carried out. indicates the number of extra elements added as dielectric frame at each edge of the reflectarray. (a) Asymmetric cut of isoflux pattern. (b) Elevation cut of LMDS pattern.

(a)

(b)