Effect of C/Si Ratio on the Electrochemical Behavior of a-SiC<sub><i>x</i></sub>:H Coatings on SS301 Substrate Deposited by PECVD

<table>Three-dimensional AFM images of (a) a-SiC<sub>0.59</sub>:H, (b) a-SiC<sub>0.75</sub>:H, (c) a-SiC<sub>0.89</sub>:H, and (d) a-SiC<sub>1.02</sub>:H coatings on SS301 substrate.</table>

International Journal of Corrosion

fig3

Figure 3

Figure 3: Effect of C/Si Ratio on the Electrochemical Behavior of a-SiC<sub><i>x</i></sub>:H Coatings on SS301 Substrate Deposited by PECVD 

International Journal of Corrosion

Effect of C/Si Ratio on the Electrochemical Behavior of a-SiCx:H Coatings on SS301 Substrate Deposited by PECVD

Figure 3

Effect of C/Si Ratio on the Electrochemical Behavior of a-SiC_x:H Coatings on SS301 Substrate Deposited by PECVD