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International Journal of Chemical Engineering
Volume 2012, Article ID 329419, 9 pages
http://dx.doi.org/10.1155/2012/329419
Research Article

Gas-Solid Reaction Properties of Fluorine Compounds and Solid Adsorbents for Off-Gas Treatment from Semiconductor Facility

1Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya 466-8555, Japan
2Iwatani Corporation, 4-5-1 Katsube, Moriyama-shi, Shiga 524-0041, Japan
3Chubu Electric Power Co., Inc., 20-1 Kitasekiyama, Odaka-cho, Midori-ku, Nagoya 459-8522, Japan

Received 23 March 2012; Accepted 19 June 2012

Academic Editor: Annabelle Couvert

Copyright © 2012 Shinji Yasui et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Shinji Yasui, Tadashi Shojo, Goichi Inoue, Kunihiko Koike, Akihiro Takeuchi, and Yoshio Iwasa, “Gas-Solid Reaction Properties of Fluorine Compounds and Solid Adsorbents for Off-Gas Treatment from Semiconductor Facility,” International Journal of Chemical Engineering, vol. 2012, Article ID 329419, 9 pages, 2012. https://doi.org/10.1155/2012/329419.