Gas-Solid Reaction Properties of Fluorine Compounds and Solid Adsorbents for Off-Gas Treatment from Semiconductor Facility

<table class="table-group" width="800px"><tr class="fig-image" id="a"><td><img alt="329419.fig.0013a" src="https://static.hindawi.com/articles/ijce/volume-2012/329419/figures/329419.fig.0013a.jpg"/></td></tr><tr class="fig-caption"><td align="center"><table><tr><td><b>(a) </b>Component</td></tr></table></td></tr><tr class="fig-image" id="b"><td><img alt="329419.fig.0013b" src="https://static.hindawi.com/articles/ijce/volume-2012/329419/figures/329419.fig.0013b.jpg"/></td></tr><tr class="fig-caption"><td align="center"><table><tr><td><b>(b) </b>F content</td></tr></table></td></tr><tr class="fig-image" id="c"><td><img alt="329419.fig.0013c" src="https://static.hindawi.com/articles/ijce/volume-2012/329419/figures/329419.fig.0013c.jpg"/></td></tr><tr class="fig-caption"><td align="center"><table><tr><td><b>(c) </b>Si content</td></tr></table></td></tr></table>

<table>EPMA photographs of the NaHCO<sub>3</sub> adsorbents before and after experiments.</table>

International Journal of Chemical Engineering

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Figure 13

Figure 13: Gas-Solid Reaction Properties of Fluorine Compounds and Solid Adsorbents for Off-Gas Treatment from Semiconductor Facility 