Gas-Solid Reaction Properties of Fluorine Compounds and Solid Adsorbents for Off-Gas Treatment from Semiconductor Facility

<div class="floats-full-page floats-full-page-figure"><h2>Figure 5</h2><div class="floats-full-page-caption"><table>Breakthrough curve as compared with inside phenomenon on fixed-bed reactor.</table></div><div class="floats-full-page-content"><table class="table-group" width="800px"><tr class="fig-image"><td><img alt="329419.fig.005" src="https://static-01.hindawi.com/articles/ijce/volume-2012/329419/figures/329419.fig.005.jpg" /></td></tr></table></div></div>

Figure 5 | Gas-Solid Reaction Properties of Fluorine Compounds and Solid Adsorbents for Off-Gas Treatment from Semiconductor Facility

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Figure 5: Gas-Solid Reaction Properties of Fluorine Compounds and Solid Adsorbents for Off-Gas Treatment from Semiconductor Facility

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Figure 5

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<p><em>International Journal of Chemical Engineering</em> publishes research focused on technologies for the production, processing, transportation and use of chemicals on an industrial scale.</p>


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<p>Chief Editor, Evangelos Tsotsas, holds the Chair of Thermal Process Engineering at Otto von Guericke University Magdeburg (Germany) since 1994. The main focus of his work is on drying, and on particle formulation processes related to drying, such as spray fluidized bed agglomeration.</p>


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