Research Article

Fabricating Pinhole-Free YSZ Sub-Microthin Films by Magnetron Sputtering for Micro-SOFCs

Figure 1

SEM images of the top-view substrates (a1) nanoporous anodized alumina, (b1) nonporous alumina plate, (c1) smooth single crystal Si wafer with 500 nm thick silicon nitride layer, top-view (a2, b2, c2) and cross-view (a3, b3, c3) of the as-deposit Y/Zr films. The deposition conditions are 200 W, 0.5 Pa, and 80 s at room temperature.
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479203.fig.001b
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