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International Journal of Electrochemistry
Volume 2016 (2016), Article ID 2935035, 10 pages
http://dx.doi.org/10.1155/2016/2935035
Research Article

Dealloying Behavior of NiCo and NiCoCu Thin Films

Department of Physics, Hope College, Holland, MI 49423, USA

Received 29 July 2016; Accepted 22 September 2016

Academic Editor: Jiehua Liu

Copyright © 2016 Benjamin E. Peecher and Jennifer R. Hampton. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

How to Cite this Article

Benjamin E. Peecher and Jennifer R. Hampton, “Dealloying Behavior of NiCo and NiCoCu Thin Films,” International Journal of Electrochemistry, vol. 2016, Article ID 2935035, 10 pages, 2016. doi:10.1155/2016/2935035